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公开时间: 2010-02-24      申请时间: 2009-09-22
申请人: BEIJING INST TECHNOLOGY

CN101655670A
patent for invention


标题(英语)

On-line detection device with function of calibrating systematic error for wave aberration of projection objective of photoetching machine


摘要(英语)

The invention discloses an on-line detection device with the function of calibrating a systematic error for wave aberration of a projection objective of a photoetching machine, belonging to the fieldof optical detection. The device comprises an object space mask plate with circular holes, a phase-shifting device, a photoelectric sensor, a memorizer, a controller, an arithmetic unit, a beam splitting device and an image space mask plate, wherein the beam splitting device comprises two binary diffraction gratings: a first grating and a second grating; and the image space mask plate comprises awindow and a first circular hole and a second circular hole with equal diameters. The second grating of the beam splitting device and the second circular hole of the image space mask plate are used aselements for calibrating the systematic error, and the systematic error of the device is calibrated according to the orthogonal property and the odd-even symmetrical property of the Zernike multinomial in a unit circle. The device of the invention is integrated on a masking workpiece platform and a silicon slice workpiece platform of the photoetching machine, and compared with the prior art, thedevice can calibrate the systematic measurement error introduced by a measuring device, thereby increasing the accuracy of measurement.


申请人详细信息

序号 名称 数据格式
1 BEIJING INST TECHNOLOGY docdb

发明人详细信息

序号 名称 数据格式
1 KE LIU docdb
2 YANQIU LI docdb
3 LIHUI LIU docdb

法律状态

序号 日期 法律代码 详细信息
1 20100224 C06 PUBLICATION
2 20100428 C10 ENTRY INTO SUBSTANTIVE EXAMINATION
3 20110105 C14 GRANT OF PATENT OR UTILITY MODEL

文档历史

公开时间: 2010-02-24
CN101655670A
申请时间: 2009-09-22
CN200910093833

CPC分类


IPC分类

G03F7/20

专利家族

41709996

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