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公开时间: 2010-08-25      申请时间: 2010-04-16
申请人: BEIJING INST TECHNOLOGY

CN101813894A
patent for invention


标题(英语)

On-line detection device of wave aberration of projection lens of lithography machine with precision calibration function


摘要(英语)

The invention relates to an on-line detection device of wave aberration of a projection lens of a lithography machine with precision calibration function, which belongs to the field of optical detection. The on-line detection device additionally introduces a grating and two circular holes in a PSPDI by utilizing the property that the system error of the PSPDI rotates along with the beam splitting direction of the grating, the two gratings and the three circular holes are taken as measurement precision calibration elements together, and the system error during the calibration of the measurement precision of the PSPDI is separated according to the orthogonal property and the odd-even symmetry property of a Zernike polynomial in the unit circular region, thereby obtaining the wave surface error of a spherical reference wave produced by diffraction of the circular holes for calibration and characterization of the measurement precision of the PSPDI and leading the on-line detection device of the projection lens of the lithography machine to have the capability of realizing the on-line detection of the wave aberration and also have the measurement precision calibration function.


申请人详细信息

序号 名称 数据格式
1 BEIJING INST TECHNOLOGY docdb

发明人详细信息

序号 名称 数据格式
1 YANQIU LI docdb
2 KE LIU docdb
3 LIHUI LIU docdb
4 HAI WANG docdb

法律状态

序号 日期 法律代码 详细信息
1 20100825 C06 PUBLICATION
2 20120208 C14 GRANT OF PATENT OR UTILITY MODEL

文档历史

公开时间: 2010-08-25
CN101813894A
申请时间: 2010-04-16
CN201010151224

CPC分类


IPC分类

G03F7/20

专利家族

42621177

被引非专利信息

引用阶段 文档类型 文档信息
SEA a 《激光与光电子学进展》20100131李艳秋,刘克《相移点衍射干涉仪的关键技术研究》全文1-7 ,第1期2

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